2-(4-苯氧基苯氧基)乙醇合成路线 （共 10 条）
反应条件
potassium carbonate in butanone T=90°C; Heating / reflux;
参考文献
DECODE GENETICS EHF.
Patent: US2008/33024 A1, 2008 ;
Location in patent: Page/Page column 22 ;
US 20080033024 A1
反应条件
lithium aluminium tetrahydride in diethyl ether T=0 - 20°C; 2 h;
参考文献
Yamansarova; Kukovinets; Zainullin; Galin; Kunakova; Zorin; Tolstikov
Russian Journal of Organic Chemistry, 2001 , vol. 37, # 2 p. 246 - 255
反应条件
toluene-4-sulfonic acid in methanol; dichloromethane Ambient temperature;
参考文献
Rodriguez, Juan B.; Gros, Eduardo G.; Stoka, Angel M.
Zeitschrift fuer Naturforschung, B: Chemical Sciences, 1989 , vol. 44, # 8 p. 983 - 987
反应条件
1: K2CO2 / dimethylformamide / 15 h / Ambient temperature 2: 9.95 g / LiAlH4 / tetrahydrofuran / 1) 0 deg C, 30 min; 2) rt, 1 h View Scheme
参考文献
Journal of the Chemical Society, Perkin Transactions 2: Physical Organic Chemistry (1972-1999), , # 7 p. 1293 - 1298
反应条件
sodium hydroxide T=20°C;
参考文献
Organic and Biomolecular Chemistry, , vol. 9, # 9 p. 3246 - 3257
参考文献
DE527714 , ;
Fortschr. Teerfarbenfabr. Verw. Industriezweige, vol. 18, p. 3013
反应条件
1: 1.) pyridine, 2.) aq. HCl / 1.) RT, 4 h, 2.) RT, 1 h 2: 73 percent / dimethylformamide / 3 h / 100 °C View Scheme
参考文献
Cinque, Gueendalina M.; Szajnman, Sergio H.; Zhong, Li; Docampo, Roberto; Schvartzapel, Andrea J.; Rodriguez, Juan B.; Gros, Eduardo G.
Journal of Medicinal Chemistry, 1998 , vol. 41, # 9 p. 1540 - 1554
反应条件
N-bromosuccinmide; triphenylphosphine in dichloromethane
T=0 - 20°C; 1 h;
参考文献
DECODE GENETICS EHF.
Patent: US2008/33024 A1, 2008 ;
Location in patent: Page/Page column 22 ;
US 20080033024 A1
反应条件
pyridine; hydrogenchloride
1.) RT, 4 h, 2.) RT, 1 h; Yield given. Multistep reaction. Yields of byproduct given;
参考文献
Cinque, Gueendalina M.; Szajnman, Sergio H.; Zhong, Li; Docampo, Roberto; Schvartzapel, Andrea J.; Rodriguez, Juan B.; Gros, Eduardo G.
Journal of Medicinal Chemistry, 1998 , vol. 41, # 9 p. 1540 - 1554
反应条件
in pyridine
Ambient temperature;
参考文献
G.D. SEARLE and CO.
Patent: EP1221441 A2, 2002 ;
Location in patent: Page 104 ;
