Malabaricone B合成路线 (共 11 条)
反应条件
boron tribromide in dichloromethane
0.333333 h; Ambient temperature;
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 1.) NaH / 1.) DMSO, r.t., 10 min, 2.) r.t., 1 h
2: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
3: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
4: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
5: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 75 percent / 2 h / 140 °C
2: 1.) potassium tert-butoxide / 1.) THF-DMSO, 2.) r.t., occasional sonication, 50 min
3: 85 percent / hydrogen / 10 percent Pd-C / ethanol / 24 h / 2942.03 Torr / Ambient temperature
4: 1.) DMSO, oxalyl chloride, 2.) Et3N / 1.) CH2Cl2, -78 deg C, 15 min, 2.) -78 deg C, 5 min, then r.t., 20 min
5: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
6: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
7: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
8: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
2: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
3: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
4: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 88 percent / N-bromosuccinimide, triphenylphosphine / tetrahydrofuran / 2 h / Ambient temperature
2: 75 percent / 2 h / 140 °C
3: 1.) potassium tert-butoxide / 1.) THF-DMSO, 2.) r.t., occasional sonication, 50 min
4: 85 percent / hydrogen / 10 percent Pd-C / ethanol / 24 h / 2942.03 Torr / Ambient temperature
5: 1.) DMSO, oxalyl chloride, 2.) Et3N / 1.) CH2Cl2, -78 deg C, 15 min, 2.) -78 deg C, 5 min, then r.t., 20 min
6: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
7: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
8: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
9: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 1.) DMSO, oxalyl chloride, 2.) Et3N / 1.) CH2Cl2, -78 deg C, 15 min, 2.) -78 deg C, 5 min, then r.t., 20 min
2: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
3: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
4: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
5: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
2: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
3: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
4: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 85 percent / hydrogen / 10 percent Pd-C / ethanol / 24 h / 2942.03 Torr / Ambient temperature
2: 1.) DMSO, oxalyl chloride, 2.) Et3N / 1.) CH2Cl2, -78 deg C, 15 min, 2.) -78 deg C, 5 min, then r.t., 20 min
3: 1.) lithium diisopropylamide, 2.) hexamethylphosphoric triamide / 1.) THF, -78 deg C, 2 h, 2.) -78 deg C, 1 h, then -15 deg C, 30 min
4: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
5: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
6: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
2: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22
反应条件
1: 88 percent / p-toluenesulfonic acid / benzene / 1 h / Heating
2: 88 percent / hydrogen / 10 percent Pd-C / acetone / 6 h / 2574.3 Torr / Ambient temperature
3: 96 percent / boron tribromide / CH2Cl2 / 0.33 h / Ambient temperature
View Scheme
参考文献
Tsuda; Hosoi; Goto
Chemical and Pharmaceutical Bulletin, 1991 , vol. 39, # 1 p. 18 - 22