1,2,3,4-四氢喹啉合成路线 （共 372 条）
反应条件
1: SOCl2 2: 78.1 percent / 1,1,3,3-tetramethylguanidinium azide / CHCl3 3: 44.1 percent Turnov. / 1,1,2-trichloro-1,2,2-trifluoro-ethane / 36 h / 135 °C 4: 86.9 percent / 650 °C / 0.01 Torr / flash vacuum pyrolyses (flow system) View Scheme
参考文献
Journal of Organic Chemistry, , vol. 49, # 17 p. 3114 - 3121
反应条件
1: 99.8 percent / 15 h / Heating 2: NaH / 1) 20 min at 0 deg C 2) reflux for 12 h 3: NaOH / 1) 1h reflux with NaOH 2) concentrated HCl 4: SOCl2 5: 1) BF3*THF 2) NaOH, 30percent H2O2 / 2) at 55-60 deg C for 90 min 6: 88 percent / triethylamine / CH2Cl2 / 2.5 h / Ambient temperature 7: 95 percent / dimethylformamide / 2 h / 60 °C 8: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 9: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 10: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: SOCl2 2: 1) BF3*THF 2) NaOH, 30percent H2O2 / 2) at 55-60 deg C for 90 min 3: 88 percent / triethylamine / CH2Cl2 / 2.5 h / Ambient temperature 4: 95 percent / dimethylformamide / 2 h / 60 °C 5: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 6: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 7: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: NaOH / 1) 1h reflux with NaOH 2) concentrated HCl 2: SOCl2 3: 1) BF3*THF 2) NaOH, 30percent H2O2 / 2) at 55-60 deg C for 90 min 4: 88 percent / triethylamine / CH2Cl2 / 2.5 h / Ambient temperature 5: 95 percent / dimethylformamide / 2 h / 60 °C 6: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 7: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 8: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: 1) BF3*THF 2) NaOH, 30percent H2O2 / 2) at 55-60 deg C for 90 min 2: 88 percent / triethylamine / CH2Cl2 / 2.5 h / Ambient temperature 3: 95 percent / dimethylformamide / 2 h / 60 °C 4: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 5: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 6: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 2: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: 88 percent / triethylamine / CH2Cl2 / 2.5 h / Ambient temperature 2: 95 percent / dimethylformamide / 2 h / 60 °C 3: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 4: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 5: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: 95 percent / dimethylformamide / 2 h / 60 °C 2: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 3: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 4: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 2: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 3: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
反应条件
1: NaH / 1) 20 min at 0 deg C 2) reflux for 12 h 2: NaOH / 1) 1h reflux with NaOH 2) concentrated HCl 3: SOCl2 4: 1) BF3*THF 2) NaOH, 30percent H2O2 / 2) at 55-60 deg C for 90 min 5: 88 percent / triethylamine / CH2Cl2 / 2.5 h / Ambient temperature 6: 95 percent / dimethylformamide / 2 h / 60 °C 7: 73 percent / hydrazine,water / 2-methyl-propan-2-ol / 3.5 h / Heating 8: 78 percent / lithium diisopropyl amid / tetrahydrofuran / 0.75 h 9: 61 percent / 4.5M HCl / H2O / 24 h / Heating View Scheme
参考文献
Journal of Organic Chemistry, , vol. 46, # 4 p. 783 - 788
