in neat (no solvent)
Au complex dissolved in THF; deposited onto MgO support at 300 K; MgO support was annealed to 900-1300 K prior to deposition of the Au; deposited Au complex treated in flowing O2 at 773 K for 3 h;
参考文献
Yan, Zhen; Chinta, Sivadinarayana; Mohamed, Ahmed A.; Fackler Jr., John P.; Goodman, D. Wayne
Journal of the American Chemical Society, 2005 , vol. 127, # 6 p. 1604 - 1605