4-氨基-2,3,5,6-四氟苯甲酸甲酯合成路线 （共 16 条）
反应条件
1: 96 percent / TFA, NaNO2, NaN3 / 2.67 h / 0 °C 2: 94 percent / LiOH*H2O / methanol; H2O / 23 h / 25 °C View Scheme
参考文献
Marcinek, Andrzej; Platz, Matthew S.; Chan, Stephen Y.; Floresca, Rey; Rajagopalan, Krishnan; et al.
Journal of Physical Chemistry, 1994 , vol. 98, # 2 p. 412 - 419
反应条件
sodium azide; trifluoroacetic acid; sodium nitrite T=0°C; 2.66667 h;
参考文献
Journal of Physical Chemistry, , vol. 98, # 2 p. 412 - 419
反应条件
1: 96 percent / TFA, NaNO2, NaN3 / 2.67 h / 0 °C 2: 94 percent / LiOH*H2O / methanol; H2O / 23 h / 25 °C 3: 99 percent / DCC / tetrahydrofuran / 34 h / 25 °C View Scheme
参考文献
Marcinek, Andrzej; Platz, Matthew S.; Chan, Stephen Y.; Floresca, Rey; Rajagopalan, Krishnan; et al.
Journal of Physical Chemistry, 1994 , vol. 98, # 2 p. 412 - 419
反应条件
tin(ll) chloride in ethanol; ethyl acetate
0.0166667 h; Ambient temperature;
参考文献
Gee; Keana
Synthetic Communications, 1993 , vol. 23, # 3 p. 357 - 360
参考文献
MERCK SERONO S.A.; THUNUGUNTLA, Siva Sanjeeva Rao; SUBRAMANYA, Hosahalli; KUNNAM, Satish Reddy; SANIVARU VIJAY, Sekhar Reddy; BINGI, Chakrapani; KUSANUR, Raviraj; SCHWARZ, Matthias; ARLT, Michael
Patent: WO2010/115736 A2, 2010 ;
Location in patent: Page/Page column 132 ;
WO 2010/115736 A2
反应条件
1: 96 percent / conc. H2SO4 / CCl4 / Heating
2: 87 percent / NaN3 / acetone; H2O / 8 h / Heating
3: 66 percent / acetophenone / cyclohexane / 5 h / Irradiation
View Scheme
参考文献
Keana, John F. W.; Cai, Sui Xiong
Journal of Organic Chemistry, 1990 , vol. 55, # 11 p. 3640 - 3647
反应条件
1: 87 percent / NaN3 / acetone; H2O / 8 h / Heating
2: 66 percent / acetophenone / cyclohexane / 5 h / Irradiation
View Scheme
参考文献
Keana, John F. W.; Cai, Sui Xiong
Journal of Organic Chemistry, 1990 , vol. 55, # 11 p. 3640 - 3647
反应条件
acetophenone in cyclohexane
5 h; Irradiation;
参考文献
Keana, John F. W.; Cai, Sui Xiong
Journal of Organic Chemistry, 1990 , vol. 55, # 11 p. 3640 - 3647
反应条件
in cyclohexane
4.5 h; Irradiation;
参考文献
Keana, John F. W.; Cai, Sui Xiong
Journal of Organic Chemistry, 1990 , vol. 55, # 11 p. 3640 - 3647
反应条件
5 h in reflux, in presence of cc. H2SO4.;
参考文献
Gmelin Handbook: F: PerFHalOrg.7, 1, page 1 - 84
