1-(氯甲基)-4-(二氯甲基)苯合成路线 （共 14 条）
反应条件
nitric acid in toluene
参考文献
Mitsubishi Gas Chemical Co., Inc.
Patent: US4328374 A1, 1982 ;
反应条件
nitric acid in para-xylene
参考文献
Mitsubishi Gas Chemical Co., Inc.
Patent: US4328374 A1, 1982 ;
反应条件
hydrogenchloride; nitric acid in para-xylene
参考文献
Mitsubishi Gas Chemical Co., Inc.
Patent: US4328374 A1, 1982 ;
反应条件
nitric acid in para-xylene
参考文献
Mitsubishi Gas Chemical Co., Inc.
Patent: US4328374 A1, 1982 ;
参考文献
Mitsubishi Gas Chemical Co., Inc.
Patent: US4328374 A1, 1982 ;
参考文献
Arditti; Palfray
Comptes Rendus Hebdomadaires des Seances de l'Academie des Sciences, 1946 , vol. 223, p. 547
反应条件
chlorine
T=138 - 205°C; 11.5 h; Photolysis;
参考文献
Bai, Ling Ling; Zhou, Yong Hao; Wang, Xiu Li; Yuan, Si Guo; Wu, Xian Li
Chinese Chemical Letters, 2011 , vol. 22, # 9 p. 1115 - 1118
反应条件
tetrachloromethane; oxygen; phosphorus pentoxide; chlorine
Irradiation;
参考文献
du Pont de Nemours and Co.
Patent: US2446430 , 1943 ;
反应条件
tetrachloromethane; oxygen; phosphorus pentoxide; chlorine
Irradiation;
参考文献
du Pont de Nemours and Co.
Patent: US2446430 , 1943 ;
参考文献
Arditti; Palfray
Comptes Rendus Hebdomadaires des Seances de l'Academie des Sciences, 1946 , vol. 223, p. 547
