反应条件
in neat (no solvent, solid phase) In, SnO, C placed in boat, Si substrate added, sealed and pumped to 1E-3Torr, Ar introduced, heated to 1000°C at 6°C/min, Ar swit ched off, O2 introduced at 500 Torr, 50 min, cooled; monitored by XRD;
参考文献
Journal of Solid State Chemistry, , vol. 186, p. 182 - 188
