in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
