Hautecloque, S.
Journal de Chimie Physique et de Physico-Chimie Biologique, 1967 , vol. 64, p. 1526 - 1532
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Gmelin Handbook: C: MVol.D2, 4.2.8.5.2, page 342 - 343
in neat (no solvent) Kinetics; Irradiation (UV/VIS); irradiation with 3130-3655Å at 172-295°C;;
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Sidebottom, H. W.; Tedder, J. M.; Walton, J. C.
Transactions of the Faraday Society, 1969 , vol. 65, p. 755 - 762
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Gmelin Handbook: C: MVol.D2, 4.2.8.5.2, page 342 - 343
water in further solvent(s) further solvent: CBrCl3; presence of H2O;;
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Little et al.
Journal of the American Chemical Society, 1963 , vol. 85, p. 3055
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Gmelin Handbook: Fe: Org.Verb.A1, 2.5.7.5.1.1, page 133 - 134
Kirillova, Marina V.; Da Silva, Jose A. L.; Da Silva, Joao J. R. Frausto; Palavra, Antonio F.; Pombeiro, Armando J. L.
Advanced Synthesis and Catalysis, 2007 , vol. 349, # 10 p. 1765 - 1774
hydrogen in acetone T=-42°C; 0.166667 h; temperature dependence of product distribution; further temperatures, further reaction times; Product distribution;
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Journal of Organic Chemistry, , vol. 61, # 20 p. 6818 - 6824
in gas vaporization of Ge (alumina-coated tungsten crucible, 1200-1300°C, 5E-3 Torr), introduction into flask (cooled with liq. N2 during Ge vaporization) together with vapor of org. halide, warming to room temp., standing for 1.5 h; further products; GC-MS, GLC;
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Mochida, Kunio; Tashiro, Kumiko; Yoshida, Yasuhiro; Mizuno, Yasuhisa
Bulletin of the Chemical Society of Japan, 1988 , vol. 61, p. 1247 - 1250
