2,3,3,3-四氟丙烯合成路线 （共 125 条）
反应条件
hydrogen fluoride; 2percentCo2O3/Cr2O3, fluorided
T=325 - 400°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54781 A1, 2008 ;
Location in patent: Page/Page column 18-19 ;
反应条件
hydrogen; 0.5percent Pd/Al2O3 fluorinated by HF
T=200°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/79265 A1, 2008 ;
Location in patent: Page/Page column 15-17 ;
反应条件
fluorided alumina
T=200 - 400°C; Gas phaseInert atmosphere; Product distribution / selectivity;
参考文献
E.I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2009/105521 A1, 2009 ;
Location in patent: Page/Page column 50 ;
反应条件
fluorinating chromium oxide (~12.2 wt.percent F)
T=380°C; Product distribution / selectivity;
参考文献
DAIKIN INDUSTRIES, LTD.; NOSE, Masatoshi; TAKAHASHI, Kazuhiro; KOMATSU, Yuzo; SUGIYAMA, Akinari; SHIBANUMA, Takashi
Patent: WO2010/50373 A2, 2010 ;
Location in patent: Page/Page column 20; 22 ;
反应条件
Cr2OxFy catalyst, wherein x+y/2=3
T=397°C; Gas phaseInert atmosphere; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: US2012/215035 A1, 2012 ;
Location in patent: Page/Page column 3-4 ;
反应条件
sulfur(IV) fluoride
T=20°C; 12 h; Yield given. Yields of byproduct given;
参考文献
Stepanov, I. V.; Burmakov, A. I.; Kunshenko, B. V.; Alekseeva, L. A.; Yagupol'skii, L. M.
Journal of Organic Chemistry USSR (English Translation), 1983 , vol. 19, p. 244 - 248
Zhurnal Organicheskoi Khimii, 1983 , vol. 19, # 2 p. 273 - 279
反应条件
hydrogen; fluorided Pd/Al2O3
T=300 - 350°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54779 A1, 2008 ;
Location in patent: Page/Page column 10-11 ;
反应条件
hydrogen fluoride; hydrogen; fluorided Pd on Al2O3
T=350°C; Product distribution / selectivity;
参考文献
E.I.DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54780 A2, 2008 ;
Location in patent: Page/Page column 20-21 ;
反应条件
KF on alumina
T=400 - 500°C; Inert atmosphere; Product distribution / selectivity;
参考文献
DAIKIN INDUSTRIES, LTD.; YAMASHITA, Tsuneo; NOSE, Masatoshi
Patent: WO2010/95764 A1, 2010 ;
Location in patent: Page/Page column 9-10 ;
反应条件
CsF/C
T=350 - 500°C; Inert atmosphere; Product distribution / selectivity;
参考文献
DAIKIN INDUSTRIES, LTD.; YAMASHITA, Tsuneo; NOSE, Masatoshi
Patent: WO2010/95764 A1, 2010 ;
Location in patent: Page/Page column 7-9 ;
