2,3,3,3-四氟丙烯合成路线 （共 125 条）
反应条件
hydrogen fluoride
T=340°C; P=760.051 Torr; 86 h; Gas phase; Product distribution / selectivity;
参考文献
ARKEMA FRANCE; DEUR-BERT, Dominique; PIGAMO, Anne; DOUCET, Nicolas; WENDLINGER, Laurent
Patent: WO2012/98420 A1, 2012 ;
Location in patent: Page/Page column 13-14 ;
反应条件
methane; nickel
T=497 - 579°C; P=822.11 Torr; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US7026520 B1, 2006 ;
Location in patent: Page/Page column 3-4 ;
反应条件
magnesium(II) fluoride
T=475 - 510°C; P=760.051 Torr; 1 - 10 h; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2009/149680 A1, 2009 ;
Location in patent: Page/Page column 2-3 ;
反应条件
hydrogen fluoride; Magtrievetrade;
T=269°C; P=760.051 Torr; Inert atmosphere; Product distribution / selectivity;
参考文献
DAIKIN INDUSTRIES, LTD.; NOSE, Masatoshi; KOMATSU, Yuzo; SUGIYAMA, Akinari; SHIBANUMA, Takashi
Patent: WO2010/16401 A2, 2010 ;
Location in patent: Page/Page column 11-12 ;
反应条件
hydrogen; 1 palladium on alumina
T=175°C; 0.00833333 h; Flow reactor;
参考文献
E. I. du Pont de Nemours and Company; KNAPP, Jeffrey, P.
Patent: WO2011/53449 A1, 2011 ;
Location in patent: Page/Page column 15 ;
反应条件
hydrogen fluoride; Catalyst M-Chromium oxide
T=365°C; P=2172.08 - 8740.03 Torr; 0.00108333 - 0.00388889 h; Gas phase; Product distribution / selectivity;
参考文献
ARKEMA INC.
Patent: WO2009/3084 A1, 2008 ;
Location in patent: Page/Page column 5-6 ;
反应条件
hydrogen; 5 Pd/C
T=80 - 90°C; Product distribution / selectivity;
参考文献
Asahi Glass Company, Limited
Patent: US2011/319677 A1, 2011 ;
Location in patent: Page/Page column 6-7 ;
反应条件
potassium hydroxide; tetrabutylammomium bromide in water
T=0 - 10°C; 20 h; Product distribution / selectivity;
参考文献
Asahi Glass Company, Limited
Patent: US2011/319678 A1, 2011 ;
Location in patent: Page/Page column 8 ;
反应条件
carbon
T=400°C; 1 h; Inert atmosphere;
参考文献
E. I. du Pont de Nemours and Company; Mahler, Barry Asher; Nappa, Mario Joseph
Patent: EP2634165 A2, 2013 ;
Location in patent: Paragraph 0121; 0122; 0123 ;
反应条件
methane
T=65 - 700°C; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US7026520 B1, 2006 ;
Location in patent: Page/Page column 3 ;
