三氯一氧化钒 三氯代氧化钒(V)合成路线 （共 117 条）
反应条件
in neat (no solvent) byproducts: VCl3, O2; 600-1000°C;
参考文献
Zeitschrift fur Anorganische und Allgemeine Chemie, , vol. 622, # 10 p. 1651 - 1657
反应条件
in water equilibrium;;
参考文献
Journal of the Indian Chemical Society, , vol. 40, p. 674 - 676
反应条件
in neat (no solvent) at 450°C;;
参考文献
V: MVol.B1, 37, page 85 - 87
N. S. A., IS-17 (1959) , vol. 14, p. 18111
反应条件
in neat (no solvent) using a fixed-bed flow reactor system at atmospheric pressure; placing of of Mg3(VO4)2 in quartz reactor; heating at 723 K under 1percent CCl2F2/He atmosphere with total flow rate of 30 ml/min for 5 h; monitoring by XRD and GC-TCD;
参考文献
Tamai, Tsukasa; Inazu, Koji; Aika, Ken-Ichi
Bulletin of the Chemical Society of Japan, 2005 , vol. 78, # 8 p. 1565 - 1574
反应条件
in neat (no solvent) react. of compds. in sealed silica tube at 170°C for 2 h;
参考文献
Zeitschrift fuer Chemie (Stuttgart, Germany), , vol. 21, p. 38 - 39
反应条件
in neat (no solvent) using a fixed-bed reaction system directly connected to GC-TCD; placing of Mg3(VO4)2 in quartz reactor; injecting of CCl4; heating at 723 K; monitoring by XRD and GC-TCD;
参考文献
Bulletin of the Chemical Society of Japan, , vol. 78, # 8 p. 1565 - 1574
反应条件
in neat (no solvent) heating in quartz tube under high vac. at 720°C about 1 - 2 h;; removal of VCl4 and VOCl3 in vac.; extn. of VCl2 and excess of VCl3 with dimethyl formamide; pptn. washing with EtOH and ether, drying in vac.;;
参考文献
Journal of the Less-Common Metals, , vol. 3, p. 29 - 33
V: MVol.B1, 84, page 227 - 230
反应条件
in neat (no solvent) heating;;
参考文献
Ber. Dtsch. Chem. Ges., , vol. 44, p. 506 - 521
V: MVol.B1, 38, page 87 - 89
反应条件
Kinetics; 120-230°C; elem. anal.;
参考文献
Bulletin of the Chemical Society of Japan, , vol. 53, # 10 p. 2843 - 2846
参考文献
Bulletin of the Chemical Society of Japan, , vol. 53, # 10 p. 2843 - 2846
