反应条件
in neat (no solvent) He, N2, H2 and 10 percent BF3 diluted in He at flow rates 80 cm**3/min, 10 cm**3/min, 10 cm**3/min, 18 cm**3/min, total pressure: 0.3 Torr, substrate temperature: 1020 +/- 20 K,;
参考文献
Matsumoto; Nishida; Akashi; Sugai
Journal of Materials Science, 1996 , vol. 31, # 3 p. 713 - 720