SiO2 in neat (no solvent, gas phase) introduction of F2 stream into liquid SOF2 (-50°C); mixture (F2/SOF2) escapes into quartz tube (containing heated Pt net/150°C); pale red flame observed; abs. exclusion of air;; condensed (liquid air cooling); removal of F2 (water jet pump/-190°C); fractionated (quartz column);;
in neat (no solvent, gas phase) Kinetics; F2 is adsorbed to Si at 120 K up to the desired coverages, and the surface is heated at a constant rate of 4 K/s. Product is desorbed at 400-800 K, depending on coverage.;
