in gas Kinetics; byproducts: HS; other Radiation; H2O2 is photolysed at 266 nm (Nd:YAG laser) in a flow reactor, addn. of CS2 (NO) and O2 (N2); HO2 yield measurement by LMR (laser magnetic resonance), SO2 yield measurement by CIMS (chemical ionization mass spectometry);
参考文献
Journal of Physical Chemistry, , vol. 94, p. 2386 - 2393
in neat (no solvent) byproducts: O3, HXeBr; Irradiation (UV/VIS); N2O//HBr/Xe mixt. photolyzed at 193 nm at 7 K; annealed at 30-35 K; not isolated; monitored by IR;
参考文献
Journal of the American Chemical Society, , vol. 125, # 6 p. 1454 - 1455
