in gas Kinetics; OH radicals treated with excess of NO3 radicals (He carrier gas) at 298 K; products not isolated; NO3 titrated with NO or tetramethylethylene before and after each run for varying reaction times;
参考文献
Journal of Physical Chemistry, , vol. 92, # 8 p. 2229 - 2234
in neat (no solvent) Kinetics; byproducts: O2; reaction of atomic O with OH in presence of O2; mechanism; rate constant at 300 °K;; luminescence measurements;;
参考文献
O: MVol.8, 35, page 2605 - 2607
C. A., AD-283044 (1960), S. 23 S , vol. 59, p. 13387
in gaseous matrix byproducts: HCl, CH2O; Irradiation (UV/VIS); reaction of Cl atoms (poducted by flash photolysis (λ>300 nm) with CH3OH and O2 (298 K; N2 or O2 diluent gas); not separated; UV spectroscopic monitoring;
参考文献
Journal of Physical Chemistry, , vol. 90, # 3 p. 441 - 444
in gas fast-flow discharge system (according to: T. E. Kleindienst, B. J. Finlayson-Pitts, J. Chem. Phys. Lett. 61 (1979) 300), halocarbon wax or boric acid coated flow tube, H or O3 excess; resonance fluorescence technique, titration of H;
参考文献
Journal of Chemical Physics, , vol. 74, # 8 p. 4533 - 4543
