in neat (no solvent) byproducts: Me3SiCl; under Ar; t-Bu-NVCl2(OSiMe3) heated at 120°C and 0.01 Torr under stirring for 3 h; sepn. by fractionated condensation (liquid N2); residue was stirred (n-pentane) at 25°C for 40 min; filtration; washed (n-pentane); dried under vacuum; elem. anal.; NMR;