80937-33-3合成路线 （共 1249 条）
反应条件
in gas
Kinetics; (He), reaction at 295 K;
参考文献
Hamdan, M.; Copp, N. W.; Wareing, D. P.; Jones, J. D. C.; Birkinshaw, K.; Twiddy, N. D.
Chemical Physics Letters, 1982 , vol. 89, p. 63 - 66
反应条件
in neat (no solvent)
HCl as by-product of combustion of SiCl4 vapor;;
参考文献
White, L. J.; Duffy, G. J.
Industrial and Engineering Chemistry, 1959 , vol. 51, p. 232 - 238
反应条件
in gas
Irradiation (UV/VIS); on photolysis (>= 300nm) of a Cl2-SiHCl3-N2-O2-mixture (0.2 Torr Cl2, 2Torr O2, 0.1 Torr SiHCl3, 700 Torr N2);; not isolated, monitoring of react. by IR;;
参考文献
Niki, H.; Maker, P. D.; Savage, C. M.; Breitenbach, L. P.; Hurley, M. D.
Journal of Physical Chemistry, 1985 , vol. 89, # 17 p. 3725 - 3729
反应条件
in water
in the dark;;
参考文献
Verda, A.
Schweiz. Wochenschr. Chem. Pharm., 1907 , vol. 45, p. 179 - 180
反应条件
in gaseous matrix
byproducts: aluminium chloride oxide; gaseous AlCl3 carried by stream of Ar to react. zone held at 400-600°C, simultaneously stream of O2 contg. 2-5 vol percent H2O introduced into react. zone, react. allowed to proceed for 2 h; chem. and X-ray anal.;
参考文献
Shoji; Matsuzaki; Saeki
Bulletin of the Chemical Society of Japan, 1982 , vol. 55, # 2 p. 437 - 440
反应条件
in gaseous matrix
gaseous AlCl3 carried by stream of Ar to react. zone held at 800-900°C, simultaneously stream of O2 contg. 2-5 vol percent H2O introduced into react. zone, react. allowed to proceed for 2 h; chem. and X-ray anal.;
参考文献
Shoji; Matsuzaki; Saeki
Bulletin of the Chemical Society of Japan, 1982 , vol. 55, # 2 p. 437 - 440
反应条件
in gaseous matrix
gaseous AlCl3 carried by stream of Ar to react. zone held at 1000°C, simultaneously stream of O2 contg. 2-5 vol percent H2O introduced into react. zone, react. allowed to proceed for 2 h; chem. and X-ray anal.;
参考文献
Shoji; Matsuzaki; Saeki
Bulletin of the Chemical Society of Japan, 1982 , vol. 55, # 2 p. 437 - 440
反应条件
in gas
Kinetics; Irradiation (UV/VIS); near-u.v. modulated photolysis of flowing Cl2-CH4-H2-O2 mixtures, 760 Torr, 303 K, quartz vessel;
参考文献
Jenkin, Michael E.; Cox, Richard A.; Hayman, Garry D.; Whyte, Lynden J.
Journal of the Chemical Society, Faraday Transactions 2: Molecular and Chemical Physics, 1988 , vol. 84, p. 913 - 930
反应条件
in gas
Kinetics; Irradiation (UV/VIS); near-u.v. modulated photolysis of flowing Cl2-CH4-H2O2-O2 mixtures, 10 Torr, 303 K, Pyrex vessel;
参考文献
Jenkin, Michael E.; Cox, Richard A.; Hayman, Garry D.; Whyte, Lynden J.
Journal of the Chemical Society, Faraday Transactions 2: Molecular and Chemical Physics, 1988 , vol. 84, p. 913 - 930
反应条件
Kinetics; Irradiation (UV/VIS); photochemical oxidn. sensibilised with Cl2, wavelength: 436 nm, below 100°C;
参考文献
Schumacher, H. J.
Anales Acoc. Quim. Arg., 1951 , vol. 39, p. 159 - 174
Full Text Show Details
Gmelin Handbook: C: MVol.D3, 2.3.1.3, page 104 - 105
