80937-33-3合成路线 （共 1249 条）
反应条件
O2 in acetonitrile byproducts: SOF4; oxidn. with two fold excess of O2 at 20°C, 12 h;
参考文献
Noftle, R. E.; Fox, W. B.
Journal of Fluorine Chemistry, 1977 , vol. 9, p. 219 - 232
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Gmelin Handbook: F: PerFHalOrg.SVol.3, 6.2.3.5, page 187 - 208
反应条件
helium total pressure 1 atm, 100°C, contact time: a few min;
参考文献
Cordes, K. L.
Chemistry and Industry (London, United Kingdom), 1966 , p. 340 - 341
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Gmelin Handbook: C: MVol.D3, 2.1.1.9, page 16 - 19
反应条件
Irradiation (UV/VIS); photchemical oxidn. sensibilized with Hg, ambient temp.,;
参考文献
Heicklen, J.; Johnston, T.
Journal of Physical Chemistry, 1967 , vol. 71, p. 1391 - 1397
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Gmelin Handbook: C: MVol.D3, 2.1.1.10, page 19 - 20
反应条件
Kinetics; Irradiation (UV/VIS); photochemical oxidn., ambient temp.;
参考文献
Marsh; Heicklen
Journal of Physical Chemistry, 1966 , vol. 70, p. 3008
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Gmelin Handbook: C: MVol.D3, 2.1.1.10, page 19 - 20
反应条件
Kinetics; Irradiation (UV/VIS); photochemical oxidn., ambient temp.;
参考文献
Marsh; Heicklen
Journal of Physical Chemistry, 1966 , vol. 70, p. 3008
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Gmelin Handbook: C: MVol.D3, 2.1.1.10, page 19 - 20
反应条件
chloroform in neat (no solvent) 100°C, 42 h;
参考文献
Razuvaev, G. A.; Zhil'tsov, S. F.; Shabanov, A. V.; Lavrent'ev, A. A.
Journal of General Chemistry USSR (English Translation), 1980 , vol. 50, p. 454 - 462
Zhurnal Obshchei Khimii, 1980 , vol. 50, p. 567 - 575
反应条件
in neat (no solvent) 100°C, 60 h;
参考文献
Razuvaev, G. A.; Zhil'tsov, S. F.; Shabanov, A. V.; Lavrent'ev, A. A.
Journal of General Chemistry USSR (English Translation), 1980 , vol. 50, p. 454 - 462
Zhurnal Obshchei Khimii, 1980 , vol. 50, p. 567 - 575
反应条件
in neat (no solvent) 100°C, 60 h; further products;
参考文献
Razuvaev, G. A.; Zhil'tsov, S. F.; Shabanov, A. V.; Lavrent'ev, A. A.
Journal of General Chemistry USSR (English Translation), 1980 , vol. 50, p. 454 - 462
Zhurnal Obshchei Khimii, 1980 , vol. 50, p. 567 - 575
反应条件
in gaseous matrix Kinetics; byproducts: O3, Cl2O6; Irradiation (UV/VIS); photolysis at wavelengths above 300 nm in a 420 l DURAN glass react. chamber, at 249 to 300 K, total pressure between 0.5 and 1000 mbar, partial pressure of O2 between 0 and 1000 mbar, total pressure adjusted with N2; not isolated, in situ IR and UV spect.;
参考文献
Zabel, F.
Berichte der Bunsen-Gesellschaft, 1991 , vol. 95, # 8 p. 893 - 900
反应条件
in methanol elem. anal.;
参考文献
Arai; Hashimoto; Yamagishi; Hida
Bulletin of the Chemical Society of Japan, 1989 , vol. 62, # 10 p. 3143 - 3149
