80937-33-3合成路线 （共 1249 条）
反应条件
in gaseous matrix byproducts: aluminium chloride oxide; gaseous AlCl3 carried by stream of Ar to react. zone held at 400-600°C, simultaneously stream of O2 contg. 2-5 vol percent H2O introduced into react. zone, react. allowed to proceed for 2 h; chem. and X-ray anal.;
参考文献
Shoji; Matsuzaki; Saeki
Bulletin of the Chemical Society of Japan, 1982 , vol. 55, # 2 p. 437 - 440
反应条件
in solid in RF magnetron sputtering in O2/Ar atm. of 2 mTorr (O2 partial pressue 0-8percentpercent); for some samples, a static field in the range of 80-120 Oe was applied parallel to the substrate (Si(100)) surface; the number of Al chips: 8, 10, 12; detd. by AES and XRD studies;
参考文献
Ha; Yoon; Kim; Lim
Journal of Magnetism and Magnetic Materials, 2005 , vol. 290-291 PART 2, p. 1571 - 1575
反应条件
in gaseous matrix evapn. of Al from Mo-cell at 1100-1175°C; addn. of matrix gas (Ar; N2) with ca. 5 mmol/h (O2-content 2-5percent); temp. of substrate: 10-12 K; Raman spectroscopy;
参考文献
Rozhanskii, I. L.; Serebrennikov, L. V.; Shevel'kov, A. F.
Russian Journal of Physical Chemistry, 1990 , vol. 64, # 2 p. 276 - 277
Zhurnal Fizicheskoi Khimii, 1990 , vol. 64, p. 521 - 524
反应条件
in gaseous matrix gaseous AlCl3 carried by stream of Ar to react. zone held at 800-900°C, simultaneously stream of O2 contg. 2-5 vol percent H2O introduced into react. zone, react. allowed to proceed for 2 h; chem. and X-ray anal.;
参考文献
Shoji; Matsuzaki; Saeki
Bulletin of the Chemical Society of Japan, 1982 , vol. 55, # 2 p. 437 - 440
反应条件
in sulfuric acid Electrolysis; oxyhydrogen gas-cel; electrolyt: 0.5 n H2SO4; electrode spaces separated by a clay-diaphragma; electrodes: platinated Pt calcinated for 2 1/2 h at 1200-1400°C; 1 mA current strength; reaction time: 45 min; ice cooling;;
参考文献
Gmelin Handbook: O: MVol.3, 110, page 606 - 608
反应条件
Au/Al2O3 or Au:Pd(1:1)/Al2O3 or Pd/Al2O3 in methanol High Pressure; reaction of H2 with O2 in CH3OH at 2°C at 3.7 MPa;
参考文献
Landon, Philip; Collier, Paul J.; Papworth, Adam J.; Kiely, Christopher J.; Hutchings, Graham J.
Chemical Communications, 2002 , # 18 p. 2058 - 2059
反应条件
N,N'-diphenylhydrazine in ethanol 0°C;;
参考文献
Walton; Filson
Journal of the American Chemical Society, 1932 , vol. 54, p. 3228
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Gmelin Handbook: O: MVol.2, 52, page 287 - 289
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Mathieson Alkali Works Inc.
Patent: DE683953 , 1939 ;
C. I, 1940 , p. 4017
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Mathieson Alkali Works Inc.
Patent: GB489978 , 1938 ;
C. A., 1939 , p. 820
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Mathieson Alkali Works Inc.
Patent: FR823335 , 1938 ;
C. I, 1938 , p. 3671
反应条件
tannic acid or gallic acid in water thermal react., temp. = 20 +/- 0.5°C (water bath), coating the react. vessel with photo paper to absorb UV radiation, react. at various pH values; determination the quantum yields of H2O2 with a ferrioxalate actinometer;
参考文献
Clapp, Philip A.; Du, Ngoc; Evans, Dennis F.
Journal of the Chemical Society, Faraday Transactions, 1990 , vol. 86, # 14 p. 2587 - 2592
反应条件
(CH3(CH2)3)4NClO4; 1-methylimidazole in dichloromethane Electrolysis; electrolysis (10-30 min) of O2 in CH2Cl2-0.1 M Bu4NClO4 soln. in presence of 0.1 M benzoic acid and 1-methylimidazole, working electrode: polymer-coated (poly-(Ru(vbpy)3)(2+)) glassy-carbon, reference electrode: Ag/Ag(1+), potential -1.3 and -1.1 V; extn. with distd. H2O, colorimetric analysis;
参考文献
Nishihara, Hiroshi; Pressprich, K.; Murray, Royce W.; Collman, James P.
Inorganic Chemistry, 1990 , vol. 29, p. 1000 - 1006
反应条件
in neat (no solvent) Electrochem. Process; reaction by influence of silent electric discharges on the mixtures with O2 in exceed;;
参考文献
Marshall, A. L.
Journal of the American Chemical Society, 1932 , vol. 54, p. 4460 - 4461
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Marshall, A. L.
Journal of Physical Chemistry, 1926 , vol. 30, p. 1078 - 1099
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Gmelin Handbook: O: MVol.3, 126, page 643 - 646
