80937-33-3合成路线 （共 1249 条）
反应条件
in solid matrix
byproducts: Ag(η1-OO); laser-ablated Ag atoms co-deposited (2-4 mmol/h) with 0.25percent CO + 0.5percent O2in Ar on CsI window (7 K, 1 h); annealed (25 or 30 K); not isolated;
参考文献
Xu, Qiang; Jiang, Ling
Journal of Physical Chemistry A, 2006 , vol. 110, # 8 p. 2655 - 2662
反应条件
in gas
Kinetics; byproducts: NO3; description of processes in a barrier discharge during electrosynthesisof O3; investigation of effect of power of discharge, working frequencyof power supply, flow rate, temp. and pressure of gas; determination ofrate constants for main reactions;; monitoring of concns. of oxides and O3 by mass spectroscopy;;
参考文献
Samoilovich, V. G.; Gibalov, V. I.
Russian Journal of Physical Chemistry (Translation of Zhurnal Fizicheskoi Khimii), 1986 , vol. 60, p. 1107 - 1116
Zhurnal Fizicheskoi Khimii, 1986 , vol. 60, p. 1841 - 1853
反应条件
C2H2 flame in liq. air,further products:combustion and decompn. products of C2H2;
参考文献
Gmelin Handbook: N: MVol.3, 2.1, page 600 - 623
反应条件
byproducts: CO2; Irradiation (UV/VIS); 15 K, in solid O2; detd. by IR;
参考文献
Tso, Tai-Ly; Lee, Edward K. C.
Journal of Physical Chemistry, 1984 , vol. 88, # 13 p. 2781 - 2787
反应条件
byproducts: H2O*SO2, H2O*SO3; Irradiation (UV/VIS); in solid O2, 15K; H2O*SO2 and H2O*SO3 present in significant amounts; detected by IR;
参考文献
Tso, Tai-Ly; Lee, Edward K. C.
Journal of Physical Chemistry, 1984 , vol. 88, # 13 p. 2776 - 2781
反应条件
Irradiation (UV/VIS); 15 K, in solid O2, 7h with 230 nm light, and 3h in white light; detd. by IR;
参考文献
Tso, Tai-Ly; Lee, Edward K. C.
Journal of Physical Chemistry, 1984 , vol. 88, # 13 p. 2781 - 2787
反应条件
in neat (no solvent)
glass pumped; purified O2 introduced; sealed; heated slowly to 650°C; homogenized at 650°C for 7 h; cooled to 400°C; transferred to another furnace (200°C) vertically; undissolved oxides condensed at cold end; detd. by absorption spectra;
参考文献
Churbanov; Shiryaev; Smetanin; Pimenov; Zaitseva; Kryukova; Plotnichenko
Inorganic Materials, 2001 , vol. 37, # 11 p. 1188 - 1194
反应条件
in tetrahydrofuran
Irradiation (UV/VIS); dissolving of Et3SiH and Ge3(C6H2Me3)6 in THF, irradn. (350 nm) at -70°C for 16 h under the ambient atmosphere; removal of solvent under vac., addn. of C6D6; crystn., filtration, sepn.by chromy. (CH2Cl2);
参考文献
Samuel, Mini S.; Jennings, Michael C.; Baines, Kim M.
Journal of Organometallic Chemistry, 2001 , vol. 636, # 1-2 p. 130 - 137
反应条件
fluorine in gas
Irradiation (UV/VIS); photolysis of mixt. containing methanol, Cl2, He, O2, and NO2 at 231 K and 100 Torr (N2);
参考文献
Christensen, Lance E.; Okumura, Mitchio; Sander, Stanley P.; Friedl, Randall R.; Miller, Charles E.; Sloan, James J.
Journal of Physical Chemistry A, 2004 , vol. 108, # 1 p. 80 - 91
反应条件
chlorine in gas
Kinetics; Irradiation (UV/VIS); photolysis of mixt. containing methanol, N2, Cl, He, O2, and NO2 at 220-298 K and 40-200 Torr (N2); not isolated, detected by UV and near-IR;
参考文献
Christensen, Lance E.; Okumura, Mitchio; Sander, Stanley P.; Friedl, Randall R.; Miller, Charles E.; Sloan, James J.
Journal of Physical Chemistry A, 2004 , vol. 108, # 1 p. 80 - 91
