3,7-二甲基-4,6-二丙基吡啶并[3,2-g]喹啉-2,5,8,10(1H,9H)-四酮合成路线 （共 21 条）
反应条件
1: 99 percent / Et3N / CHCl3 / 0.02 h / 20 °C
2: 73 percent / UHP / trifluoroacetic acid / 0.17 h / 20 °C
3: UHP / trifluoroacetic acid / 24 h / 20 °C
4: 43 mg / TsCl / acetonitrile; H2O / 24 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1.1: 62 percent / NaH / 1,2-dimethoxy-ethane / 14 h / 20 °C
2.1: 49 percent / AgOCOCF3 / 1,2-dimethoxy-ethane / 15 h / 20 °C
3.1: 100 percent / aq. H2SO4 / 3 h / 20 °C
4.1: 87 percent / CAN / acetonitrile; H2O / 3 h / 20 °C
5.1: 14 percent / silica gel / CHCl3 / 0.02 h / 20 °C
6.1: UHP / trifluoroacetic acid / 4 h / 20 °C
6.2: 30 percent / TsCl / acetonitrile; H2O / 4 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1: 73 percent / UHP / trifluoroacetic acid / 0.17 h / 20 °C
2: UHP / trifluoroacetic acid / 24 h / 20 °C
3: 43 mg / TsCl / acetonitrile; H2O / 24 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1.1: 49 percent / AgOCOCF3 / 1,2-dimethoxy-ethane / 15 h / 20 °C
2.1: 100 percent / aq. H2SO4 / 3 h / 20 °C
3.1: 87 percent / CAN / acetonitrile; H2O / 3 h / 20 °C
4.1: 14 percent / silica gel / CHCl3 / 0.02 h / 20 °C
5.1: UHP / trifluoroacetic acid / 4 h / 20 °C
5.2: 30 percent / TsCl / acetonitrile; H2O / 4 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1.1: 100 percent / aq. H2SO4 / 3 h / 20 °C
2.1: 87 percent / CAN / acetonitrile; H2O / 3 h / 20 °C
3.1: 14 percent / silica gel / CHCl3 / 0.02 h / 20 °C
4.1: UHP / trifluoroacetic acid / 4 h / 20 °C
4.2: 30 percent / TsCl / acetonitrile; H2O / 4 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1.1: 87 percent / CAN / acetonitrile; H2O / 3 h / 20 °C
2.1: 14 percent / silica gel / CHCl3 / 0.02 h / 20 °C
3.1: UHP / trifluoroacetic acid / 4 h / 20 °C
3.2: 30 percent / TsCl / acetonitrile; H2O / 4 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1.1: 20 mg / TsCl / H2O; acetonitrile / 24 h / 60 °C
2.1: UHP / trifluoroacetic acid / 4 h / 20 °C
2.2: 30 percent / TsCl / acetonitrile; H2O / 4 h / 60 °C
View Scheme
参考文献
Perez, Jose Maria; Lopez-Alvarado, Pilar; Pascual-Alfonso, Eva; Avendano, Carmen; Menendez, J. Carlos
Tetrahedron, 2000 , vol. 56, # 26 p. 4575 - 4583
反应条件
1: 92 percent / 0.67 h / Heating
2: 81 percent / 1 N HCl / acetone; tetrahydrofuran / 23 h / 65 °C
3: 95 percent / cc. HCl / 1.5 h / 11 °C
View Scheme
参考文献
Kelly, T. Ross; Field, Jeffrey, A.; Li, Qun
Tetrahedron Letters, 1988 , vol. 29, # 29 p. 3545 - 3546
反应条件
1: 92 percent / 0.67 h / Heating
2: 81 percent / 1 N HCl / acetone; tetrahydrofuran / 23 h / 65 °C
3: 95 percent / cc. HCl / 1.5 h / 11 °C
View Scheme
参考文献
Kelly, T. Ross; Field, Jeffrey, A.; Li, Qun
Tetrahedron Letters, 1988 , vol. 29, # 29 p. 3545 - 3546
反应条件
1: 81 percent / 1 N HCl / acetone; tetrahydrofuran / 23 h / 65 °C
2: 95 percent / cc. HCl / 1.5 h / 11 °C
View Scheme
参考文献
Kelly, T. Ross; Field, Jeffrey, A.; Li, Qun
Tetrahedron Letters, 1988 , vol. 29, # 29 p. 3545 - 3546
