1: 27 percent / CH2Cl2 / 1 h / Irradiation; other solvent and irradiation time; also in the presence of O2 2: 64 percent / CH2Cl2 / 1 h / Irradiation View Scheme
参考文献
Armesto, Diego; Horspool, William M.; Martin, Nazario; Ramos, Ana; Seoane, Carlos
Journal of Organic Chemistry, 1989 , vol. 54, # 13 p. 3069 - 3072
1: 27 percent / CH2Cl2 / 1 h / Irradiation; other solvent and irradiation time; also in the presence of O2
2: 54 percent / CH2Cl2 / 1 h / Irradiation
View Scheme
参考文献
Armesto, Diego; Horspool, William M.; Martin, Nazario; Ramos, Ana; Seoane, Carlos
Journal of Organic Chemistry, 1989 , vol. 54, # 13 p. 3069 - 3072
