1: [13C]-L-Arginine With N,N-dicyclohexylamine in acetone T=20°C; 2: 1-[[(9H-fluoren-9-ylmethoxy)carbonyl]oxy]-2,5-pyrrolidinedione With sodium carbonate in water; acetonitrile T=0 - 20°C; pH=8; 3: With potassium hydrogensulfate in water; acetonitrile pH=2 - 3;

in acetonitrile T=20°C; pH=9.2; 0.25 h; aq. borate buffer;

1: Fmoc-Arg(Pbf)-Wang polystyrene resin With piperidine in N,N-dimethyl-formamide 0.0833333 h; Automated synthesizersolid phase reaction; 2: fmoc-L-Arg(Pbf)-OH With 1-methyl-pyrrolidin-2-one; O-(1H-benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexafluorophosphate; N-ethyl-N,N-diisopropylamine in N,N-dimethyl-formamide 0.75 h; Automated synthesizersolid phase reaction; 3: 4-(hydroxymethyl)-benzoic acid; fmoc-L-Arg(Pbf)-OH Further stages;

1: Fmoc-Arg(Pbf)-Wang polystyrene resin With piperidine in N,N-dimethyl-formamide 0.0833333 h; Automated synthesizerMicrowave irradiationsolid phase reaction; 2: fmoc-L-Arg(Pbf)-OH With 1-methyl-pyrrolidin-2-one; O-(1H-benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexafluorophosphate; N-ethyl-N,N-diisopropylamine in N,N-dimethyl-formamide 0.75 h; Automated synthesizerMicrowave irradiationsolid phase reaction; 3: 4-(hydroxymethyl)-benzoic acid; fmoc-L-Arg(Pbf)-OH Further stages;

T=50°C; 5 h;

1: Fmoc-Rink Amide AM resin With piperidine in N,N-dimethyl-formamide 0.0833333 h; Automated synthesizerMicrowave irradiationsolid phase reaction; 2: fmoc-L-Arg(Pbf)-OH With 1-methyl-pyrrolidin-2-one; O-(1H-benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexafluorophosphate; N-ethyl-N,N-diisopropylamine in N,N-dimethyl-formamide 0.75 h; Automated synthesizerMicrowave irradiationsolid phase reaction; 3: 4-(hydroxymethyl)-benzoic acid; fmoc-L-Arg(Pbf)-OH Further stages;

trifluoroacetic acid in water kinetics of acidolytic removal of Mtr protecting group; other solvents;

trifluoroacetic acid in water kinetics of acidolytic removal of Tip protecting group; other solvents;

trifluoroacetic acid in water kinetics of acidolytic removal of Mtbs protecting group; other solvents;

methanesulfonic acid; trifluoroacetic acid 0.25 h; other NG-protected Fmoc-Arg; var. conditions;