1-[2-氨基-1-(4-甲氧基苯基)乙基]环己醇合成路线 （共 28 条）
参考文献
US4535186 A1, ;
US 4535186 A
反应条件
1.1: sodium methylate / methanol / 2 h / 0 - 5 °C / Large scale reaction 1.2: 4 h / 0 - 5 °C / Large scale reaction 2.1: hydrogen / isopropyl alcohol / 45 - 55 °C / 7500.75 - 9000.9 Torr View Scheme
参考文献
Organic Process Research and Development, , vol. 15, # 6 p. 1392 - 1395
反应条件
in 3,6,9,12,15,18,21,24,27-nonaoxanonacosane-1,29-diol T=190°C; 3 h; Product distribution / selectivity;
参考文献
Niddam-Hildesheim, Valerie; Shenkar, Natalia; Shachan-Tov, Sharona
Patent: US2008/139849 A1, 2008 ;
Location in patent: Page/Page column 5 ;
反应条件
in toluene 5 h; Reflux;
参考文献
Saravanan, Mohanarangam; Kumar, Karra Suresh; Reddy, Padi Pratap; Satyanarayana, Bollikonda
Synthetic Communications, 2010 , vol. 40, # 13 p. 1880 - 1886
反应条件
1: With formic acid in water T=95 - 100°C; 2: With sodium hydroxide in water pH=> 12; 3: With hydrogenchloride in water T=25 - 30°C;
参考文献
ALEMBIC LIMITED; PONNAIAH, Ravi; ARORA, Sunil; DESAI, Sanjay; RATHOD, Dhiraj
Patent: WO2010/46808 A2, 2010 ;
Location in patent: Page/Page column 12 ;
反应条件
1: 1-[2-dimethylamino-1-(4-methoxy-phenyl)-ethyl]-cyclohexanol With potassium carbonate in PEG-400 1 h; Inert atmosphere; 2: With 5-tert-butyl-2-methyl-phenyl sulfide in PEG-400 T=160°C; 15 h; Inert atmosphere; 3: formaldehyd With formic acid in water T=25°C; pH=3; 8 h; Reflux; Product distribution / selectivity;
参考文献
ZENTIVA, K.S.; RADL, Stanislav; RIDVAN, Ludek; KLECAN, Ondrej; HRUBY, Petr
Patent: WO2011/124190 A2, 2011 ;
Location in patent: Page/Page column 24 ;
反应条件
in 3,6,9,12,15,18,21,24,27-nonaoxanonacosane-1,29-diol T=190°C; 3 h; Product distribution / selectivity;
参考文献
Niddam-Hildesheim, Valerie; Shenkar, Natalia; Shachan-Tov, Sharona
Patent: US2008/139849 A1, 2008 ;
Location in patent: Page/Page column 5 ;
反应条件
sodium hydroxide; formaldehyd; formic acid in water
参考文献
Dolitzky, Ben-Zion; Aronhime, Judith; Wizel, Shlomit; Nisnevich, Gennady A.
Patent: US2004/220278 A1, 2004 ;
反应条件
1: With formic acid in water 20 h; Heating / reflux; 2: With hydrogenchloride in water pH=2; 3: With sodium hydroxide in water T=0°C;
参考文献
SEPRACOR INC.
Patent: WO2008/103461 A2, 2008 ;
Location in patent: Page/Page column 63 ;
反应条件
1: With formic acid in water 2 h; Heating / reflux; 2: With sodium hydroxide in water T=0°C; pH=~ 10;
参考文献
Solvay Pharmaceuticals, B.V.
Patent: US2009/5455 A1, 2009 ;
Location in patent: Page/Page column 6-7 ;
