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1: trichlorosilane With C17H36N2OPtSi2 0.0833333 h; Inert atmosphereCooling with water bath; 2: styrene T=16°C; 7 h; Inert atmosphere; Product distribution / selectivity;
参考文献
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Patent: WO2011/81277 A2, 2011 ;
Location in patent: Page/Page column 16-18 ;