2-氨基-4,5-双(2-甲氧基乙氧基)苯腈合成路线 (共 11 条)
反应条件
sodium dithionite in water T=50°C; 2.5 h;
参考文献
Chandregowda, Venkateshappa; Rao, Gudapati Venkateswara; Reddy, Goukanapalli Chandrasekara
Organic Process Research and Development, 2007 , vol. 11, # 5 p. 813 - 816
反应条件
1.1: nitric acid / acetic acid / 4 h / 0 °C 2.1: sodium dithionite / water / 3 h / 50 °C 2.2: 0.5 h / 65 °C View Scheme
参考文献
Bulletin of the Korean Chemical Society, , vol. 32, # 3 p. 909 - 914
反应条件
1.1: phosphorous pentoxide / anhydrous xylene / 18 h / Reflux 2.1: nitric acid / acetic acid / 4 h / 0 °C 3.1: sodium dithionite / water / 3 h / 50 °C 3.2: 0.5 h / 65 °C View Scheme
参考文献
Bulletin of the Korean Chemical Society, , vol. 32, # 3 p. 909 - 914
反应条件
1.1: urea / 0.5 h / 220 °C 2.1: phosphorous pentoxide / anhydrous xylene / 18 h / Reflux 3.1: nitric acid / acetic acid / 4 h / 0 °C 4.1: sodium dithionite / water / 3 h / 50 °C 4.2: 0.5 h / 65 °C View Scheme
参考文献
Bulletin of the Korean Chemical Society, , vol. 32, # 3 p. 909 - 914
反应条件
1.1: tetra-(n-butyl)ammonium iodide; potassium carbonate / N,N-dimethyl-formamide / 1 h / 100 °C 1.2: 50 - 85 °C 2.1: water; potassium hydroxide / methanol / 4 h / 20 °C 3.1: urea / 0.5 h / 220 °C 4.1: phosphorous pentoxide / anhydrous xylene / 18 h / Reflux 5.1: nitric acid / acetic acid / 4 h / 0 °C 6.1: sodium dithionite / water / 3 h / 50 °C 6.2: 0.5 h / 65 °C View Scheme
参考文献
Bulletin of the Korean Chemical Society, , vol. 32, # 3 p. 909 - 914
反应条件
acetic acid in toluene 4 h; Heating / reflux;
参考文献
WO2007/138612 A2, ;
Page/Page column 11 ;
反应条件
1: acetic acid; N,N-dimethyl-formamide dimethyl acetal / toluene / 4 h / 105 °C 2: acetic acid / toluene / 5 h / 60 °C 3: toluene / 5 h / 125 °C View Scheme
参考文献
Bulletin of the Korean Chemical Society, , vol. 32, # 3 p. 909 - 914
反应条件
1: With acetic acid in isopropyl alcohol 4 h; Reflux; 2: With hydrogenchloride in isopropyl alcohol T=20°C; pH=3.0 - 4.0; Product distribution / selectivity;
参考文献
RANBAXY LABORATORIES LIMITED; MURUGESAN, Balaguru; VEMPALI, Anandam; SATHYANARAYANA, Swargam; THAPER, Rajesh, Kumar; PRASAD, Mohan
Patent: WO2010/109443 A1, 2010 ;
Location in patent: Page/Page column 18 ;
反应条件
1: acetic acid; N,N-dimethyl-formamide dimethyl acetal / toluene / 4 h / 105 °C 2: acetic acid / toluene / 5 h / 60 °C 3: toluene / 5 h / 125 °C 4: hydrogenchloride / methanol / 0.05 h / 15 - 20 °C View Scheme
参考文献
Chandregowda, Venkateshappa; Rao, Gudapati Venkateswara; Reddy, Goukanapalli Chandrasekara
Organic Process Research and Development, 2007 , vol. 11, # 5 p. 813 - 816
反应条件
acetic acid in N,N-dimethyl-formamide
T=110°C; 2 h;
参考文献
Chandregowda, Venkateshappa; Rao, Gudapati Venkateswara; Reddy, Goukanapalli Chandrasekara
Organic Process Research and Development, 2007 , vol. 11, # 5 p. 813 - 816