Creemers, H. M. J. C.; Verbeek, F.; Noltes, J. G.
Journal of Organometallic Chemistry, 1967 , vol. 8, p. 469 - 477
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Gmelin Handbook: Sn: Org.Verb.4, 1.2.1.1.7.4.6, page 83 - 84
Creemers, H. M. J. C.; Verbeek, F.; Noltes, J. G.
Journal of Organometallic Chemistry, 1967 , vol. 8, p. 469 - 477
Full Text Show Details
Gmelin Handbook: Sn: Org.Verb.4, 1.2.1.1.7.4.6, page 83 - 84
in neat (no solvent)
addn. 1 equiv. of tinhydride; excess of tinhydride no further reactn.; not isolated; identified 90percent SiF2H2, 5percent SiF3H and 5percent SiH4 in product mixt.);
参考文献
D'Errico, John J.; Sharp, Kenneth G.
Inorganic Chemistry, 1989 , vol. 28, p. 2177 - 2180
in neat (no solvent)
inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 6-8 h; not isolated; IR spectroscopy (identified 95percent SiF3H, trace SiF2H2 and trace SiH4 in product mixt.);
参考文献
D'Errico, John J.; Sharp, Kenneth G.
Inorganic Chemistry, 1989 , vol. 28, p. 2177 - 2180