反应条件
in gas
byproducts: MgCl2; Irradiation (UV/VIS); UV photolysis of CH2I2 in the presence of O3; injecting of IO radicals to reaction chamber; treatment with Hg at 298 K and near-atmospheric pressure; washing of reaction flask with HCl; heating; addn. of toluene and n-BuMgCl in THF; centrifuging at 0°C for 10 min with shaking; addn. of 0.6 M HCl; centrifuging; monitoring by GS-MS;
参考文献
Raofie, Farhad; Snider, Graydon; Ariya, Parisa A.
Canadian Journal of Chemistry, 2008 , vol. 86, # 8 p. 811 - 820
