in neat (no solvent) byproducts: O3, HXeBr; Irradiation (UV/VIS); N2O//HBr/Xe mixt. photolyzed at 193 nm at 7 K; annealed at 30-35 K; not isolated; monitored by IR;
参考文献
Khriachtchev, Leonid; Pettersson, Mika; Lundell, Jan; Tanskanen, Hanna; Kiviniemi, Tiina; Runeberg, Nino; Raesaenen, Markku
Journal of the American Chemical Society, 2003 , vol. 125, # 6 p. 1454 - 1455
in solid Irradiation (UV/VIS); mixtures of HBr, O2 and Ar (molar ratio Ar/HBr=50-200, O2/HBr=1-4) were condensed at 4 K on a CsBr window and radiated with UV>2000 Å;; UR absorption spectrum;;
参考文献
Milligan, D. E.; Jacox, M. E.
Journal of Chemical Physics, 1963 , vol. 38, p. 2627 - 2631
in gaseous matrix byproducts: O3, OBrO; Irradiation (UV/VIS); mixt. of HBr/O2/excess Ne was introduced into vac. chamber and depositedon CsI plate cooled to about 6 K; irradiated by two xenon lamps (155-19 5 nm) for 240 min or at 350-385 nm for 180 min; not isolated; monitored by IR spectroscopy;
in hydrogen bromide dissolving CuO in aq. HBr, evapn. over H2SO4 in the air or in N2-gas of low pressure;;
参考文献
Gmelin Handbook: Br: MVol., 6.3, page 208 - 213
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Naumann, A.
Ber., 1914 , vol. 47, p. 247 - 256
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Gmelin Handbook: Cu: MVol.B1, 133, page 292 - 293
