反应条件
in neat (no solvent)
byproducts: NOCl, NO2Cl; Irradiation (UV/VIS); passing dry N2O4 over the surface of freshly distd. PCl3 cooled at -40 °C and under irradiation with UV light; absortion under formation of a dark red liq.; expelling NO, N2O3, NOCl, NO2Cl;; isolation of liquid products by fractionation; liquid phase containing POCl3, P2O3Cl4 and P4O4Cl10; yield of P2O3Cl4 25 percent, P4O4Cl10 3 percent;;
参考文献
Gmelin Handbook: P: MVol.C, 184, page 424 - 427
Full Text Show Details
Rother, E. G. F.
Diss. Muenchen 1959, S. 1/98
