反应条件
silica gel in water
aq. Ni-salt soln. was absorbed on SiO2, drying at 393 K, adding to aq. NaBH4 soln. stirring for 30 min, solid was washed 3 times with H2O then with EtOH, dried in vac. desiccator for 3 h, annealing at 523-813< K; monitored by XRD; Ni metal was formed at 523 K and disappeared at 813 K,NiO was formed above 813 K;
参考文献
Parks, Greg L.; Pease, Melissa L.; Burns, Autumn W.; Layman, Kathryn A.; Bussell, Mark E.; Wang, Xianqin; Hanson, Jonathon; Rodriguez, Jose A.
Journal of Catalysis, 2007 , vol. 246, # 2 p. 277 - 292