反应条件
in hexane byproducts: H2, CO; Irradiation (UV/VIS); quartz ampule, Fe- and Si-compd. dissoln., stirring by rotation, coolingwith air, medium pressure Hg lamp, mixture filtration, soln. of P-compd . addn.; bottom layer sepn., washing (hexane), residual solvent removing (reducedpressure), residue dissoln. in diethyl ether, cooling (-10°C); G C, HPLC, elem. anal.;
参考文献
Russian Journal of General Chemistry, , vol. 69, # 6 p. 910 - 912
