1,1-二甲基硅杂环丁烷 二甲基三亚甲基硅烷合成路线 （共 97 条）
反应条件
tungsten in HEL
T=900°C; P=12 Torr; Gas phase; Mechanism; Temperature;
参考文献
Tong; Shi
Journal of Mass Spectrometry, 2010 , vol. 45, # 2 p. 215 - 222
反应条件
T=560°C; Further byproducts given. Title compound not separated from byproducts;
参考文献
Gusel'Nikov, L. E.; Volkova, V. V.; Avakyan, V. G.; Volnina, E. A.; Zaikin, V. G.; et al.
Journal of Organometallic Chemistry, 1984 , vol. 271, # 1-3 p. 191 - 206
反应条件
T=560°C; stream of helium;
参考文献
Gusel'Nikov, L. E.; Volkova, V. V.; Avakyan, V. G.; Volnina, E. A.; Zaikin, V. G.; et al.
Journal of Organometallic Chemistry, 1984 , vol. 271, # 1-3 p. 191 - 206
反应条件
T=600°C; further temperature; Product distribution;
参考文献
Conlin,R.T.; Huffaker,H.B.; Kwak,Y.W.
Journal of the American Chemical Society, 1985 , vol. 107, p. 731
反应条件
hydrogenchloride
T=499.9°C; P=0.5 Torr; Ea; Rate constantThermodynamic data;
参考文献
Davidson, Iain M. T.; Dean, Christopher E.; Lawrence, F. Timothy
Journal of the Chemical Society, Chemical Communications, 1981 , # 2 p. 52 - 53
反应条件
T=560°C; Further byproducts given;
参考文献
Gusel'nikov, L. E.; Volkova, V. V.; Volnina, E. A.; Avakyan, V. G.; Nametkin, N. S.
Doklady Chemistry, 1984 , vol. 274, p. 56 - 58
Doklady Akademii Nauk SSSR, 1984 , vol. 274, # 5 p. 1106 - 1109
反应条件
oxygen
T=519.9°C; P=0.6 Torr; Ea; Rate constantThermodynamic dataMechanism;
参考文献
Davidson, Iain M. T.; Dean, Christopher E.; Lawrence, F. Timothy
Journal of the Chemical Society, Chemical Communications, 1981 , # 2 p. 52 - 53
反应条件
T=700 - 750°C; P=0.0001 - 0.1 Torr; other monosilacyclobutanes, also deuterated, var. temp.; Mechanism;
参考文献
Nefedov, O. M.; Maltsev, A. K.; Khabashesku, V. N.; Korolev, V. A.
Journal of Organometallic Chemistry, 1980 , vol. 201, # 1 p. 123 - 136
反应条件
T=680°C; other temperatures; Product distribution;
参考文献
Hassner, Alfred; Soderquist, John A.
Tetrahedron Letters, 1980 , vol. 21, p. 429 - 432
反应条件
hydrogen bromide
HeatingEa; Rate constantThermodynamic data;
参考文献
Davidson, Iain M. T.; Dean, Christopher E.; Lawrence, F. Timothy
Journal of the Chemical Society, Chemical Communications, 1981 , # 2 p. 52 - 53
