Kinetics; Flowing afterglow app., He buffer gas (0.5 Torr), 298 K, radical anion generated by electron impact on corresponding neutral complex, neutral ligand substrate was added to the helium flow.; Ion compn. of the flow monitored with quadrupole mass filter and electron multiplier.;
参考文献
McDonald, Richard N.; Schell, Philip L.
Organometallics, 1988 , vol. 7, p. 1806 - 1820
in various solvent(s) Irradiation; Product distribution;
参考文献
Broomhead, Eleanor J.; McLauchlan, Keith A.; Roe, Jonathan C.
Journal of the Chemical Society, Perkin Transactions 2: Physical Organic Chemistry (1972-1999), 1980 , p. 796 - 804
