SO2 Kinetics; Flowing afterglow app., He buffer gas (0.5 Torr), 298 K, radical anion generated by electron impact on corresponding neutral complex, neutral ligand substrate was added to the helium flow.; Ion compn. of the flow monitored with quadrupole mass filter and electron multiplier.;

Kinetics; Flowing afterglow app., He buffer gas (0.5 Torr), 298 K, radical anion generated by electron impact on corresponding neutral complex, neutral ligand substrate was added to the helium flow.; Ion compn. of the flow monitored with quadrupole mass filter and electron multiplier.;

Kinetics; Flowing afterglow app., He buffer gas (0.5 Torr), 298 K, radical anion generated by electron impact on corresponding neutral complex, neutral ligand substrate was added to the helium flow.; Ion compn. of the flow monitored with quadrupole mass filter and electron multiplier.;

Kinetics; Flowing afterglow app., He buffer gas (0.5 Torr), 298 K, radical anion generated by electron impact on corresponding neutral complex, neutral ligand substrate was added to the helium flow.; Ion compn. of the flow monitored with quadrupole mass filter and electron multiplier.;