in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Gong, Yu; Wang, Xuefeng; Andrews, Lester; Chen, Mingyang; Dixon, David A.
Organometallics, 2011 , vol. 30, # 16 p. 4443 - 4452
in ethylene glycol dimethyl ether
all operations in sealed evacuated tubes with thoroughly dried and degassed solvents; La cutting and t-BuOCu stirred at ca. 20° for 35 h; excess of La and copper ppt. sepd. by centrifugation; reaction mixt. concd. and kept at 80° until complete dissolution of a finely dispersed ppt.; cooled slowly to 20°; crystals sepd. and dried in vacuo; identified by elem. anal.;
参考文献
Nikitinsky; Bochkarev; Khorshev
Russian Chemical Bulletin, 2000 , vol. 49, # 7 p. 1270 - 1274
