反应条件
in acetone inert atmosphere, Schlenk techniques; slurry (V- and Na-compds., bpy and solvent) stirring overnight at room temp., NaCl ppt. filtration off, NBu4ClO4 addn. to filtrate, solvent removal (vac.), residue washing (Et2O), redissoln. (acetone); distn. (A4 molecular sieve), pptn. on large excess Et2O addn., ppt. filtration off, washing (Et2O), vac. drying; elem. anal.;
参考文献
Castro, Stephanie L.; Sun, Ziming; Grant, Craig M.; Bollinger, John C.; Hendrickson, David N.; Christou, George
Journal of the American Chemical Society, 1998 , vol. 120, # 10 p. 2365 - 2375
