反应条件
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-percent SOF4, 27 vol.-percent SOF2, 5.2 vol.-percent SF6, 1 vol.-percent SO2F2, 35 vol.-percent N2, 1 vol.-percent NO;
参考文献
Journal of the American Chemical Society, , vol. 82, p. 3838 - 3840