80937-33-3合成路线 （共 1249 条）
反应条件
in gaseous matrix O2F produced inside an atmospheric pressure plasma jet of He/CF4/O2 gas mixt. at 200-350 °C; not sepd.;
参考文献
Kim, Yongho; Park, Jaeyoung; Rosocha, Louis A.; Teslow, Hilary L.; Herrmann, Hans W.
Applied Physics Letters, 2005 , vol. 87, # 1 art. no. 011502
反应条件
in gas other Radiation; radiolysis (30 ns pulse of 2 MeV electrons, Febetron 705B) of O2 mixt. with Ar/F2; 295-359 K; monitoring by UV spectroscopy;
参考文献
Pagsberg, Palle; Ratajczak, Emil; Sillesen, Alfred; Jodkowski, Jerzy T.
Chemical Physics Letters, 1987 , vol. 141, p. 88 - 94
反应条件
in solid matrix Kinetics; depositing gas mixtures (diluted in Ar) onto CsI window at 16 K in a high vacuum chamber;
参考文献
Misochko, Eugenii Ya.; Akimov, Alexander V.; Wight, Charles A.
Chemical Physics Letters, 1997 , vol. 274, # 1-3 p. 23 - 28
反应条件
in gas Kinetics; detected by UV absorption spectroscopy;;
参考文献
Wallington, Timothy J.; Maricq, M. Matti; Ellermann, Thomas; Nielsen, Ole J.
Journal of Physical Chemistry, 1992 , vol. 96, # 2 p. 982 - 986
反应条件
in neat (no solvent, gas phase) byproducts: H2; mixt. (1:1) passing through quartz tube heated to 400-900°C (total pressure ca. 25 mTorr);
参考文献
Kawashima, Yoshiyuki; Takeo, Harutoshi; Matsumura, Chi
Journal of Chemical Physics, 1981 , vol. 74, # 10 p. 5430 - 5435
反应条件
caesium in neat (no solvent) formation on Cs deposited by evapn. on the surface of Ni(111) or Pt(111) crystals under 2E-7 or 15.3E-4 Pa O2 at 100 K;
参考文献
Jupille; Dolle; Besancon
Surface Science, 1992 , vol. 260, # 1-3 p. 271 - 285
反应条件
chloroform in chloroform Irradiation (UV/VIS); dissolution of (NEt4)(SbCl4) in 0.1 M NEt4Cl in CHCl3, flash photolysisin the presence of oxygen; not isolated; UV;
参考文献
Shinohara, Nobuyoshi; Ohshima, Masaaki
Bulletin of the Chemical Society of Japan, 2000 , vol. 73, # 7 p. 1599 - 1604
反应条件
Electrochem. Process; electrochemical activity of He/N2/O2/NO/NO2 gas mixt. on platinum paste electrode in zirconia eletrolytic cell (600-800°C); open-circuit voltage and steady-state current monitoring;
参考文献
Gessner; Nagy; Michaels
Journal of the Electrochemical Society, 1988 , vol. 135, # 5 p. 1294 - 1301
反应条件
NaOH or KOH in not given reaction by use of a O3-O2 mixture in a strongly alcaline 0.1n-KI soln. with 1-10percent NaOH or KOH for a period of 20-30 min.;;
参考文献
Willard, H. H.; Merritt, L. L.
Industrial and Engineering Chemistry, Analytical Edition, 1942 , vol. 14, p. 489 - 490
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Gmelin Handbook: O: MVol.4, 88, page 1176 - 1178
反应条件
Na2CO3 or K2CO3 in not given reaction by use of a O3-O2 mixture in a Na2CO3- or K2CO3-containing alcaline 0.1n-KI soln. for a period of 20-30 min.;;
参考文献
Willard, H. H.; Merritt, L. L.
Industrial and Engineering Chemistry, Analytical Edition, 1942 , vol. 14, p. 489 - 490
Full Text View citing articles Show Details
Gmelin Handbook: O: MVol.4, 88, page 1176 - 1178
