in neat (no solvent)
Electrochem. Process; discharge tube;;
参考文献
Besson, A.; Fournier, L.
Comptes Rendus Hebdomadaires des Seances de l'Academie des Sciences, 1910 , vol. 150, p. 1752 - 1754
Full Text Show Details
Gmelin Handbook: S: MVol.B3, 106, page 1761 - 1762
in neat (no solvent)
other Radiation; prepn. using a microwave plasma jet that operates at atm. pressure usinghydrogen as work gas (frequence 2.45 GHz, input power 800 W, 100 kPa, f low rate 500 ml/min); silicon was deposited on the molybdenum substrate of the plasma reactor;
magnesium
obtained HCl can be removed from react. mixt. since it reacts with metal;
参考文献
Cueilleron, J.; Reymonet, J. L.
Bulletin de la Societe Chimique de France, 1967 , p. 1367 - 1370
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Gmelin Handbook: B: B-Verb.9, 1.2.2.1, page 15 - 20
in gas
coatings on Si3N4 deposited over 2 h at 950 - 1050 °C and 10.7 kPa;
参考文献
Zemskova, Svetlana M.; Jones, Camille Y.; Cooley, Kevin M.; Haynes, J. Allen
Journal of the American Ceramic Society, 2004 , vol. 87, # 12 p. 2201 - 2207
